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To address the limitations of destructive, ex situ metrology for nanostructured electronics, the authors developed an optical diagnostic that tracks Fabry-P茅rot cavity resonance shifts to detect real-time semiconductor surface degradation. Non-destructive monitoring is critical for isolating sublimation and structural damage in active heterostructures without disrupting their operational environment. By integrating a distributed Bragg reflector beneath the sublimating layer, the technique accurately tracks vacuum surface loss via spectral shifts, establishing a non-invasive pathway for in situ defect monitoring.
Nanostructured semiconductor degradation can now be monitored non-destructively in real time by turning surface loss into directly measurable Fabry-P茅rot optical cavity resonance shifts.
Current surface damage evaluation for nanostructured electronic devices requires specialized equipment or conditions outside the designed operating environment and cannot be used for in situ evaluation of surface damage. In this work, we developed a non-destructive method to probe the surface sublimation of a semiconductor heterostructure which can be applied to other semiconductor damage mechanisms. This approach employs shifts in the resonances of an optical cavity comprising the surface and an integrated distributed Bragg reflector fabricated below the semiconductor heterostructure undergoing sublimation. We performed the demonstration of this technique under vacuum, but surface damage effects can be observed in any operational environment either in situ or ex situ.
