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ETCH-X improves human body fitting by decoupling the "undressing" (filtering clothing dynamics) and "dense fitting" (establishing dense correspondences) stages, enabling modular training on composable datasets. It uses a tightness-aware fitting paradigm to filter clothing and implicit dense correspondences for robustness against noisy or partial inputs. ETCH-X achieves significant performance gains over ETCH on both seen and unseen datasets, demonstrating improved outfit generalization and pose robustness for bodies and hands.
Achieve robust human body fitting across diverse clothing, poses, and input completeness by disentangling "undressing" and "dense fitting" stages.
Human body fitting, which aligns parametric body models such as SMPL to raw 3D point clouds of clothed humans, serves as a crucial first step for downstream tasks like animation and texturing. An effective fitting method should be both locally expressive-capturing fine details such as hands and facial features-and globally robust to handle real-world challenges, including clothing dynamics, pose variations, and noisy or partial inputs. Existing approaches typically excel in only one aspect, lacking an all-in-one solution.We upgrade ETCH to ETCH-X, which leverages a tightness-aware fitting paradigm to filter out clothing dynamics ("undress"), extends expressiveness with SMPL-X, and replaces explicit sparse markers (which are highly sensitive to partial data) with implicit dense correspondences ("dense fit") for more robust and fine-grained body fitting. Our disentangled"undress"and"dense fit"modular stages enable separate and scalable training on composable data sources, including diverse simulated garments (CLOTH3D), large-scale full-body motions (AMASS), and fine-grained hand gestures (InterHand2.6M), improving outfit generalization and pose robustness of both bodies and hands. Our approach achieves robust and expressive fitting across diverse clothing, poses, and levels of input completeness, delivering a substantial performance improvement over ETCH on both: 1) seen data, such as 4D-Dress (MPJPE-All, 33.0% ) and CAPE (V2V-Hands, 35.8% ), and 2) unseen data, such as BEDLAM2.0 (MPJPE-All, 80.8% ; V2V-All, 80.5% ). Code and models will be released at https://xiaobenli00.github.io/ETCH-X/.
