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This paper introduces physics-informed neural networks (PINNs) and neural operators (NOs), including a novel Waveguide Neural Operator (WGNO), to simulate EUV electromagnetic wave diffraction from lithography masks. The WGNO replaces computationally expensive components of the waveguide method with a neural network. Experiments on 2D and 3D masks demonstrate that PINNs and NOs achieve competitive accuracy with significantly reduced prediction times compared to numerical solvers, with WGNO showing state-of-the-art performance and strong generalization.
Forget slow, traditional solvers: neural operators and physics-informed networks can now simulate EUV lithography mask diffraction with competitive accuracy and a massive speedup.
Physics-informed neural networks (PINNs) and neural operators (NOs) for solving the problem of diffraction of Extreme Ultraviolet (EUV) electromagnetic waves from contemporary lithography masks are presented. A novel hybrid Waveguide Neural Operator (WGNO) is introduced, based on a waveguide method with its most computationally expensive components replaced by a neural network. To evaluate performance, the accuracy and inference time of PINNs and NOs are compared against modern numerical solvers for a series of problems with known exact solutions. The emphasis is placed on investigation of solution accuracy by considered artificial neural systems for 13.5 nm and 11.2 nm wavelengths. Numerical experiments on realistic 2D and 3D masks demonstrate that PINNs and neural operators achieve competitive accuracy and significantly reduced prediction times, with the proposed WGNO architecture reaching state-of-the-art performance. The presented neural operator has pronounced generalizing properties, meaning that for unseen problem parameters it delivers a solution accuracy close to that for parameters seen in the training dataset. These results provide a highly efficient solution for accelerating the design and optimization workflows of next-generation lithography masks.
