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This paper introduces a self-calibrating framework where an LLM generates topology-specific analytical design equations for analog circuit sizing directly from the circuit netlist. The LLM outputs a Python function that maps device dimensions to performance constraints, which is then calibrated using a deterministic loop that extracts process parameters from transistor-level simulation and uses prediction-error feedback to compensate for analytical inaccuracies. Validated across six OTA topologies and two process nodes, the framework achieves specifications in a few simulations and demonstrates cross-node portability without retraining.
LLMs can now autonomously generate and calibrate interpretable analog circuit sizing functions, achieving performance comparable to human experts with minimal simulation.
We present a self-calibrating framework for analog circuit sizing in which a large language model (LLM) derives topology-specific analytical design equations directly from a raw circuit netlist. Unlike existing AI-driven sizing methods where the model proposes parameter adjustments or reduces a search space, the LLM produces a complete Python sizing function tracing each device dimension to a specific performance constraint. A deterministic calibration loop extracts process-dependent parameters from a single transistor-level simulation, while a prediction-error feedback mechanism compensates for analytical inaccuracies. We validate the framework on six operational transconductance amplifier (OTA) topologies spanning three families at two process nodes (180 nm and 40 nm CMOS). All 12 topology-node combinations achieve all specifications, converging in 2-9 simulations for 11 of 12 cases, with one outlier requiring 16 simulations due to an extremely narrow feasible region. Despite large initial prediction errors, convergence depends on the measurement-feedback architecture, not prediction accuracy. This one-shot calibration automatically captures process-dependent variations, enabling cross-node portability without modification, retraining, or per-process characterization.