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This paper introduces OptoLlama, a masked diffusion language model, for the inverse design of optical multilayer thin films, representing layer stacks as sequences of material-thickness tokens. By conditioning generation on optical spectra (reflectance, absorptance, transmittance), OptoLlama learns a probabilistic mapping from optical response to structure. Evaluated on 3,000 targets, OptoLlama achieves a 2.9x reduction in mean absolute spectral error compared to nearest-neighbor baselines and a 3.45x reduction compared to the state-of-the-art OptoGPT.
Diffusion models can now outperform specialized architectures in the challenging task of inverse design for optical thin films, suggesting their broader applicability in materials science.
Inverse design of optical multilayer stacks seeks to infer layer materials, thicknesses, and ordering from a desired target spectrum. It is a long-standing challenge due to the large design space and non-unique solutions. We introduce \texttt{OptoLlama}, a masked diffusion language model for inverse thin-film design from optical spectra. Representing multilayer stacks as sequences of material-thickness tokens, \texttt{OptoLlama} conditions generation on reflectance, absorptance, and transmittance spectra and learns a probabilistic mapping from optical response to structure. Evaluated on a representative test set of 3,000 targets, \texttt{OptoLlama} reduces the mean absolute spectral error by 2.9-fold relative to a nearest-neighbor template baseline and by 3.45-fold relative to the state-of-the-art data-driven baseline, called \texttt{OptoGPT}. Case studies on designed and expert-defined targets show that the model reproduces characteristic spectral features and recovers physically meaningful stack motifs, including distributed Bragg reflectors. These results establish diffusion-based sequence modeling as a powerful framework for inverse photonic design.